wafer lithography

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• wafer lithography — plokštelės litografija statusas T sritis radioelektronika atitikmenys: angl. full wafer lithography; wafer lithography; wafer printing vok. Ganzscheibenlithografie, f rus. литография по всему полю пластины, f pranc. lithographie de la tranche, f; …   Radioelektronikos terminų žodynas

• full-wafer lithography — plokštelės litografija statusas T sritis radioelektronika atitikmenys: angl. full wafer lithography; wafer lithography; wafer printing vok. Ganzscheibenlithografie, f rus. литография по всему полю пластины, f pranc. lithographie de la tranche, f; …   Radioelektronikos terminų žodynas

• wafer printing — plokštelės litografija statusas T sritis radioelektronika atitikmenys: angl. full wafer lithography; wafer lithography; wafer printing vok. Ganzscheibenlithografie, f rus. литография по всему полю пластины, f pranc. lithographie de la tranche, f; …   Radioelektronikos terminų žodynas

• Wafer (electronics) — Polished 12 and 6 silicon wafers. The flat cut into the right wafer indicates its doping and crystallographic orientation (see below) …   Wikipedia

• wafer-stepper lithography — žingsninė plokštelių litografija statusas T sritis radioelektronika atitikmenys: angl. wafer stepper lithography vok. Wafer Stepper Lithografie, f rus. последовательная шаговая литография пластин, f pranc. lithographie de projection tranche à… …   Radioelektronikos terminų žodynas

• Wafer-Stepper-Lithografie — žingsninė plokštelių litografija statusas T sritis radioelektronika atitikmenys: angl. wafer stepper lithography vok. Wafer Stepper Lithografie, f rus. последовательная шаговая литография пластин, f pranc. lithographie de projection tranche à… …   Radioelektronikos terminų žodynas

• Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …   Wikipedia

• Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

• Immersion lithography — is a photolithography resolution enhancement technique that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal… …   Wikipedia

• Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as …   Wikipedia

• Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is …   Wikipedia